Join
today
Boliven PRO is more than just patent search
- Build and save lists using the powerful Lists feature
- Analyze and download your search results
- Share patent search results with your clients
Patents »
US20090213375: Optical method for the characterization of laterally-patterned samples in integrated circuits
Filing Information
Patent Family
21 Claims, 18 Drawings
Abstract
Disclosed is a method for characterizing a sample having a structure disposed on or within the sample, comprising the steps of applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in the sample, applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample, sensing from a reflection of the second pulse a change: in optical response of the sample, and relating a time of occurrence of the change in optical response to at least one dimension of the structure.
- 1-62. (canceled)
- 63. A method comprising:
applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in a sample, where the sample comprises a plurality of structures disposed on or within the sample;
applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample;
sensing from a reflection of the second pulse a change in optical response of the sample; and
relating a time of occurrence of the change in optical response to at least one dimension of the structure,
where relating comprises:
applying a beam of light to the surface so that the beam of light generates a diffracted beam of light;
determining at least one characteristic of the diffracted beam of light; and
calculating a repeat distance of the plurality of structures based at least in part on the at least one characteristic of the diffracted beam of light.
- 74. A system comprising:
an optical source unit configured to apply a first pulse of light to a surface of a sample for creating a propagating strain pulse in the sample, and to apply a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample, where the sample comprises a plurality of structures disposed on or within the sample;
where the optical source unit is further configured to apply a beam of light to the surface to generate a diffracted beam of light;
a sensor configured to sense a reflection of the second pulse a change in optical response of the sample; and
a processor configured to relate a time of occurrence of the change in optical response to at least one dimension of the structure,
where the processor is further configured to determine at least one characteristic of the diffracted beam of light and calculate a repeat distance of the plurality of structures based at least in part on the determined at least one characteristic of the diffracted beam of light.
- 80. A non-destructive system comprising:
a first pulse applying means for applying a first pulse of light to a surface of a sample for creating a propagating strain pulse in the sample, where the sample comprises a plurality of structures disposed on or within the sample,
a second pulse applying means for applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample;
a beam applying means for applying a beam of light to the surface to generate a diffracted beam of light;
a sensing means for sensing from a reflection of the second pulse a change in optical response of the sample; and
a relating means for relating a time of occurrence of the change in optical response to at least one dimension of the structure,
where the relating means is further for determining at least one characteristic of the diffracted beam of light; and calculating a repeat distance of the plurality of structures based on the determined at least one characteristic of the diffracted beam of light.
References Cited
The current document has no citations.
Patent Family
The current document is not in a family.
Boliven’s Predicted Expiration Date includes in its calculation the number of days of patent term adjustment a U.S. patent is entitled. The Predicted Expiration Date does not, currently, include in its calculation the payment of maintenance fees, the filing of any disclaimer(s), and/or patent term extension, but Boliven is working to include this information in the near future.