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US20090213375: Optical method for the characterization of laterally-patterned samples in integrated circuits

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Filing Information

Inventor(s) Hamphrey J. Maris ·
Assignee(s) Brown University Research Foundation ·
Correspondent HARRINGTON & SMITH, PC ·
Application Number US12381640
Filing date 03/13/2009
Publication date 08/27/2009
Predicted expiration date 08/06/2016
U.S. Classifications 356/364  · 356/625  ·
International Classifications G01B1102  · G01J400  ·
Kind CodeA1
21 Claims, 18 Drawings


Abstract

Disclosed is a method for characterizing a sample having a structure disposed on or within the sample, comprising the steps of applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in the sample, applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample, sensing from a reflection of the second pulse a change: in optical response of the sample, and relating a time of occurrence of the change in optical response to at least one dimension of the structure.

Independent Claims | See all claims (21)

  1. 1-62. (canceled)
  2. 63. A method comprising: applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in a sample, where the sample comprises a plurality of structures disposed on or within the sample; applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample; sensing from a reflection of the second pulse a change in optical response of the sample; and relating a time of occurrence of the change in optical response to at least one dimension of the structure, where relating comprises: applying a beam of light to the surface so that the beam of light generates a diffracted beam of light; determining at least one characteristic of the diffracted beam of light; and calculating a repeat distance of the plurality of structures based at least in part on the at least one characteristic of the diffracted beam of light.
  3. 74. A system comprising: an optical source unit configured to apply a first pulse of light to a surface of a sample for creating a propagating strain pulse in the sample, and to apply a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample, where the sample comprises a plurality of structures disposed on or within the sample; where the optical source unit is further configured to apply a beam of light to the surface to generate a diffracted beam of light; a sensor configured to sense a reflection of the second pulse a change in optical response of the sample; and a processor configured to relate a time of occurrence of the change in optical response to at least one dimension of the structure, where the processor is further configured to determine at least one characteristic of the diffracted beam of light and calculate a repeat distance of the plurality of structures based at least in part on the determined at least one characteristic of the diffracted beam of light.
  4. 80. A non-destructive system comprising: a first pulse applying means for applying a first pulse of light to a surface of a sample for creating a propagating strain pulse in the sample, where the sample comprises a plurality of structures disposed on or within the sample, a second pulse applying means for applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample; a beam applying means for applying a beam of light to the surface to generate a diffracted beam of light; a sensing means for sensing from a reflection of the second pulse a change in optical response of the sample; and a relating means for relating a time of occurrence of the change in optical response to at least one dimension of the structure, where the relating means is further for determining at least one characteristic of the diffracted beam of light; and calculating a repeat distance of the plurality of structures based on the determined at least one characteristic of the diffracted beam of light.

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Referenced By

Document NumberAssigneeInventorsIssue/Pub Date
US7912100 IMRA America, Inc. Lawrence Shah et al. Mar 2011
US8467056 --

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