Filing Information

Inventor(s)	Shunichi Ishihara ·
Assignee(s)	Canon Kabushiki Kaisha ·  View assignee updates
Attorney/Agent(s)	Fitzpatrick, Cella, Harper & Scinto ·
Primary Examiner	Thurman K. Page ·
Application Number	US6751423
Filing date	07/03/1985
Issue date	06/23/1987
Predicted expiration date	07/03/2005
U.S. Classifications	118/501  · 118/620  ·
International Classifications	C23C 1308  ·
Kind Code	A
International Classifications	118715;620;719;50.1;724;730 ·
Foreign Priority	JP59140469 - 07/09/1984 ·

Patent Family

Abstract

An apparatus for forming a deposited film comprises a chamber, which can be brought into a reduced pressure, for forming a deposited film on a substrate by introducing a starting gas into said chamber and decomposing or polymerizing said gas, the apparatus is provided with both a means for decomposing or polymerizing said gas by discharging and a means for decomposing or polymerizing said gas by heat.

Independent Claims | See all claims (2)

1. 1. An apparatus for forming a deposited film comprising:a first compartment for forming a film on a substrate through thermal decomposition or polymerization of a starting gas, said first compartment having an evacuation means, a starting gas introducing means, a substrate holding means, and a heat applying means;a second compartment for forming a film on a substrate through discharge decomposition or polymerization of a starting gas, said second compartment having an evacuation means, a starting gas introducing means, a substrate holding means, and a dischargae generating means; anda means for delivering a substrate into and out of the first and second compartments.