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US5449554: Antistatic film and method of manufacturing the same

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Filing Information

Inventor(s) Kazufumi Ogawa ·
Assignee(s) Matsushita Electric Industrial Co., Ltd. ·
Attorney/Agent(s) Fish & Richardson ·
Primary Examiner Nakarani; D. S. ·
Application Number US8110704
Filing date 08/20/1993
Issue date 09/12/1995
Predicted expiration date 08/20/2013
U.S. Classifications 428/333  · 427/399  ·
International Classifications B32B 704  ·
Kind CodeA
International Classifications 427399;402 ·
Foreign Priority JP4230870 - 08/31/1992 ·
12 Claims, No Drawings


Abstract

In a molecule of a monomolecular film, a metal complex is introduced to form an antistatic film. This film is desirably transparent, durable, extremely thin and weakly conductive. The method of manufacturing an antistatic film involves (i) exposing a substrate with an active hydrogen atom thereon to a chemical adsorbent containing a straight carbon-chain group with a silyl group at one end and a phosphonate or carboxyl group at the other end to form a chemically adsorbed monomolecular film, and (ii) soaking the monomolecular film in a solution of a metal salt to form a film containing a complex of the metal element. An antistatic multi-monomolecular film can also be formed by laminating the monomolecular films using hydroxyl groups each bonding to the metal element in each monomolecular film.

Independent Claims | See all claims (12)

  1. 1. An antistatic film comprising a molecule with a straight carbon-chain group chemically adsorbed and bonded to a substrate via a covalent bond, the film being a monomolecular film or a multi-monomolecular film, wherein said molecule with a straight carbon-chain group comprises at least one metal complex selected from the group consisting of a metal-phosphonate complex and a metal-carboxy complex.
  2. 6. A method of manufacturing an antistatic film comprising the steps of:subjecting a substrate having an active hydrogen-containing group on its surface to a condensation reaction with a chemical adsorbent containing a straight carbon-chain group with a silyl group at a first end and one group selected from the group consisting of a phosphonate group and a carboxyl group at a second end to form a monomolecular film; andsoaking said monomolecular film in a solution of a metal salt to react said one group selected from the group consisting of a phosphonate group and a carboxyl group on said monomolecular film with said metal salt to form a metal complex.

References Cited

U.S. Patent Documents

Document NumberAssigneesInventorsIssue/Pub Date
US4283476 Eastman Kodak Company Farnsworth et al. Aug 1981
US4539061 Yeda Research and Development Co., Ltd. Sagiv Sep 1985
US5091468 T.S.B. Ltd. Takeuchi Feb 1992

Foreign Patent Documents

Document NumberAssigneesInventorsIssue/Pub Date
EP0091741MINNESOTA MINING AND MANUFACTURING COMPANYOct 1983
FR2410029DAICEL LTDJun 1979

Other Publications

European Search Report (Application No. EP93113927), Dec. 17, 1993.

Referenced By

Document NumberAssigneeInventorsIssue/Pub Date
US7776397 Seiko Epson Corporation Naoyuki Toyoda Aug 2010