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US5616438: Reticle and a method for measuring blind setting accuracy using the same

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Filing Information

Inventor(s) Joon Hwang ·
Assignee(s) Hyundai Electronics Industries Co., Ltd. ·
Attorney/Agent(s) Merchant, Gould, Smith, Edell, Welter & Schmidt ·
Primary Examiner S. Rosasco ·
Application Number US8415720
Filing date 04/03/1995
Issue date 04/01/1997
Predicted expiration date 04/03/2015
U.S. Classifications 430/5  · 430/22  ·
International Classifications G03F 900  ·
Kind CodeA
International Classifications 4305;22 ·
Foreign Priority KR19946957 - 04/01/1994 ·
6 Claims, No Drawings


Abstract

A method for setting the blind of a stepper comprising the steps of: forming a first pattern which is made on a wafer by said blind, and a second pattern which is made on the wafer by chrome patterns of a reticle; comparing said first pattern with said second pattern; and measuring a setting error of said blind from the difference between said first pattern and second pattern.

Independent Claims | See all claims (6)

  1. 1. A method for measuring the setting error of a blind of a stepper, said blind having a shape, comprising the steps of:providing said blind and a reticle having a linear pattern, said linear pattern having the same shape as is formed by said blind;setting the reticle and the blind to expose a photoresist layer so that one of a first case and a second case occur, said first case occurring when a first pattern formed by the blind and a second pattern formed by the reticle are apparent when the photoresist is developed, said second case occurring when light passing through the blind overexposes the photoresist and the second pattern is not shown the photoresist is developed;observing the photoresist when developed to distinguish which of the first and second cases has occurred and in the first case, measuring the setting error of said blind from any difference in size between said first pattern and said second pattern to obtain blind setting error.
  2. 4. A method for measuring the setting error of a blind of a stepper, said blind having a shape, comprising the steps of:providing said blind and a reticle having a plurality of linear patterns, said linear patterns having the same shape as is formed by said blind;setting the reticle and the blind to expose a photoresist layer so that one of a first case and a second case occur, said first case occurring when a first pattern formed by the blind and second patterns formed by the reticle are apparent when light passing photoresist is developed, said second case occurring when light passing through the blind overexposes the photoresist and the second patterns are not shown when the photoresist is developed;observing the photoresist when developed to distinguish which of the first and second cases has occurred and in the first case, measuring the setting error of said blind from any difference in size between said first pattern and one of said second patterns to obtain blind setting error.

References Cited

U.S. Patent Documents

Document NumberAssigneesInventorsIssue/Pub Date
US5444538 New Vision Systems, Inc. Pellegrini Aug 1995

Referenced By

Document NumberAssigneeInventorsIssue/Pub Date
US5773180 Mitsubishi Denki Kabushiki Kaisha Yoshikatu Tomimatu Jun 1998