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US6059891: Apparatus and method for washing substrate

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Filing Information

Inventor(s) Minoru Kubota · Kenichi Miyamoto · Hideya Tanaka · Ryoji Higuchi ·
Assignee(s) Tokyo Electron Limited ·
Attorney/Agent(s) Graham & James LLP ·
Primary Examiner Randy Gulakowski ·
Assistant Examiner Alexander Markoff ·
Application Number US9120551
Filing date 07/22/1998
Issue date 05/09/2000
Predicted expiration date 07/22/2018
U.S. Classifications 134/18  · 134/902  ·
International Classifications B08B 704  ·
Kind CodeA
International Classifications 134113;56 R;902;1.3;2;18;32;33;34;6;57 R;1;7 ·
Foreign Priority JP9197226 - 07/23/1997 ·
24 Claims, No Drawings


Abstract

An apparatus for washing a substrate comprises a spin chuck for holding and rotating a substrate, washing brush mechanism for supplying a washing liquid onto a surface of the substrate held on the spin chuck, and applying a physical force to contaminants present on a surface of the substrate so as to remove contaminants, a supporting arm for supporting the washing brush mechanism, an arm driving mechanism for driving the supporting arm to move the washing means along the surface from a central portion toward a peripheral portion of the substrate, and a control device for controlling the operation of at least one of the washing means, the spin chuck and the arm driving mechanism so as to control the physical force acting on the contaminants present on the surface of the substrate depending on the state of the contaminants.

Independent Claims | See all claims (24)

  1. 1. An apparatus for washing a substrate, comprising:a spin chuck for holding and rotating a substrate to be washed;washing means for supplying a washing liquid onto a surface of the substrate held on the spin chuck and applying a physical force to contaminants present on a surface of the substrate so as to remove said contaminants;a supporting arm for supporting the washing means;an arm driving mechanism for driving the supporting arm to move the washing means along the surface from a central portion toward a peripheral portion of the substrate; andcontrol means for controlling the operation of at least one of the washing means, the spin chuck and the arm driving mechanism so as to control the physical force acting on the contaminants present on the surface of the substrate depending on a detected distribution of contaminants on the surface of the substrate.
  2. 15. A method of washing a substrate, comprising the steps of:(a) detecting a distribution of contaminants present on a surface of a substrate to be washed;(b) holding the substrate by a spin chuck;(c) aligning washing means mounted to an arm movably supported on an arm driving mechanism relative to the surface of the substrate holded by the spin chuck;(d) rotating the substrate together with the spin chuck; and(e) washing said substrate by supplying a washing liquid onto the washing surface of the substrate, which is kept rotating, and controlling the operation of at least one of the washing means, the spin chuck and the arm driving mechanism depending on the distribution of contaminants detected in step (a), and applying a physical force to the contaminants present on the surface of the substrate so as to remove the contaminants.

References Cited

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Patent Family

Document NumberAssigneeInventorsIssue/Pub Date
US6059891 Tokyo Electron Limited Minoru Kubota et al. May 2000
JP3320640 Sep 2002
EP0893819 TOKYO ELECTRON LIMITED Kubota, Minoru, et al. Oct 2005
DE69832011 TOKYO ELECTRON LTD KUBOTA MINORU et al. Dec 2005