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US6639080: Pyrazolate copper complexes, and MOCVD of copper using same

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Filing Information

Inventor(s) Chongying Xu · Thomas H. Baum · Ziyun Wang ·
Assignee(s) Advanced Technology Materials, Inc. ·
Attorney/Agent(s) Margaret Chappuis · Steven J. Hultquist ·
Primary Examiner Joseph K. McKane ·
Assistant Examiner Sonya Wright ·
Application Number US10061705
Filing date 02/01/2002
Issue date 10/28/2003
Prior Publication Data
Predicted expiration date 03/13/2020
U.S. Classifications 548/101  ·
International Classifications --
Kind CodeB2
International Classifications 548101 ·
Related U.S. Application DataThis application is a DIV of Ser. No 09/524,063 filed Mar. 13, 2000, now U.S. Pat. No. 6,417,369.
10 Claims, 7 Drawings


Abstract

Copper pyrazolate precursor compositions useful for the formation of copper in semiconductor integrated circuits, e.g., interconnect metallization in semiconductor device structures, as an adhesive seed layer for plating, for the deposition of a thin-film recording head and for circuitization of packaging components. The copper pyrazolate precursor compositions include fluorinated and non-fluorinated pyrazolate copper (I) complexes and their Lewis base adducts. Such precursors are usefully employed for liquid delivery chemical vapor deposition of copper or copper-containing material on a substrate.

Independent Claims | See all claims (10)

  1. 1. A copper precursor composition comprising a pyrazolate copper (I) Lewis base adduct of the formula (RR′R″)PzCuL, wherein: (RR′R″)Pz is a pyrazolyl moiety of the formula: R, R′ and R″ are independently the same as or different from one another and each of R, R′ and R″ is independently selected from H, C6-C10 aryl, C6-C10 fluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, C1-C6 perfluoroalkyl, C6-C10 perfluoroaryl and C3-C6 cycloalkyl, with the proviso that at least one of R, R′ and R″ contains fluorine; and L is a Lewis base ligand.
  2. 2. A copper precursor of the formula (RR′R″)PzCuL wherein: (R,R′R″)Pz is a pyrazolyl moiety of the formula: and R, R′ and R″ are independently the same as or different from one another and each of R, R′ and R″ is independently selected from H, C6-C10 aryl, C6-C10 fluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, C1-C6 perfluoroalkyl, C6-C10 perfluoroaryl and C3-C6 cycloalkyl, with the proviso that at least one of R, R′ and R″ contains fluorine; and L is a Lewis base ligand.
  3. 8. A pyrazolate copper (I) Lewis base adduct precursor composition that is devoid of oxygen constituents therein, wherein said precursor composition comprises a pyrazolyl moiety of the formula: wherein R, R′ and R″ are independently the same as or different from one another and each of R, R′ and R″ is independently selected from H, C6-C10 aryl, C6-C10 fluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, C1-C6 perfluoroalkyl, C6-C10 perfluoroaryl and C3-C6 cycloalkyl, with the proviso that at least one of R, R′ and R″ contains fluorine.
  4. 9. A copper precursor composition selected from the group consisting of (CF3)2PzCu3, (CF3)2PzCu(3-hexyne), and (CF3)2PzCubis(tms)acetylene, wherein Pz is a pyrazolyl moiety and tms is trimethylsilyl.
  5. 10. (CF3)2PzCu(3-hexane), wherein Pz is a pyrazolyl moiety.

References Cited

U.S. Patent Documents

Document NumberAssigneesInventorsIssue/Pub Date
US5085731 Air Products and Chemicals, Inc. Norman et al. Feb 1992
US5098516 Air Products and Chemicals, Inc. Norman et al. Mar 1992
US5144049 Air Products and Chemicals, Inc. Norman et al. Sep 1992
US5204314 Advanced Technology Materials, Inc. Kirlin Apr 1993
US5225561 Advanced Technology Materials, Inc. Kirlin et al. Jul 1993
US5280012 Advanced Technology Materials Inc. Kirlin et al. Jan 1994
US5322712 Air Products and Chemicals, Inc. Norman et al. Jun 1994
US5362328 Advanced Technology Materials, Inc. Gardiner et al. Nov 1994
US5453494 Advanced Technology Materials, Inc. Kirlin et al. Sep 1995
US5536323 Advanced Technology Materials, Inc. Kirlin et al. Jul 1996
US5711816 Advanced Technolgy Materials, Inc. Kirlin et al. Jan 1998
US5820664 Advanced Technology Materials, Inc. Gardiner et al. Oct 1998
US5919522 Advanced Technology Materials, Inc. Baum et al. Jul 1999
US6110529 Gardiner et al. Aug 2000
US6417369* Advanced Technology Materials, Inc. Xu et al. Jul 2002
* cited by examiner

Other Publications

STN International® CAPLUS Database, Accession No. 1992:518740; Fantucci et al. Journal of the Chemical Society, Dalton Transactions: Inorganic Chemistry (1972-1999) (12), 1981-8 (1992), abstract.*
H.V. Rasika Dias, Sharon A. Polach, and Ziyun Wang, “Coinage Metal Complexes of 3,5-bis(trifluoromethyl)pyrazolate Ligand: Synthesis and Characterization of 3,5-(CF3)2PzCu 3 and 3,5-(CF3)2PzAg 3 ”, Journal of Fluorine Chemistry 2000, 103, 163-169.