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US6668075: Position detection apparatus and method

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Filing Information

Inventor(s) Ayako Nakamura · Masahiro Nakagawa · Tatsuo Fukui ·
Assignee(s) Nikon Corporation ·
Attorney/Agent(s) Oliff & Berridge PLC ·
Primary Examiner Timothy M. Johnson ·
Assistant Examiner Ali Bayat ·
Application Number US9344858
Filing date 06/28/1999
Issue date 12/23/2003
Predicted expiration date 06/28/2019
U.S. Classifications 382/144  · 700/96  · 348/95  · 382/151  ·
International Classifications --
Kind CodeB1
International Classifications 382151 · 382145 · 382141 · 382100 · 382144 · 348 86 · 348 87 · 348 94 · 348 95 · 348125 · 348126 · 348128 · 348129 · 348130 · 348131 · 348143 · 700 95 · 700 96 · 700212 · 29833 · 438 16 ·
Foreign Priority JP10195128 - 06/26/1998 ·
48 Claims, 5 Drawings


Abstract

A position detection apparatus for and method of detection the position of a pattern formed on a substrate (e.g, a wafer). The apparatus (100) comprises an illumination system capable of illuminating the pattern, and an imaging optical system arranged to converge light from the substrate (126) to form an image of the pattern. The apparatus further includes a detector (170) that photoelectrically detects the pattern image and generates a first output signal containing a representation of the image, and position detection system (174), electrically connected to the detector, that detects a position of the pattern based on the first output signal, and determines a deviation of the position from an ideal position. The position detection system then generates a second output signal containing deviation information representing the deviation. The apparatus further comprises a memory unit (M), electrically connected to the position detection system, that stores the deviation information contained in the second output signal. Further included in apparatus 100 is a correction process unit (B), electrically connected to the memory unit, that generates a correction value for eliminating the deviation based on the deviation information.

Independent Claims | See all claims (48)

  1. 1. A position detecting apparatus comprising: a detection optical system arranged to obtain an optical information including a position of an object to be detected; a detector including a detecting area and arranged to convert the optical information into an electrical signal; a memory unit that stores an error information arising according to a detecting position of the detecting area; a correction processor, electrically connected to the detector and the memory unit, that corrects the electrical signal based on the error information, and generates a correcting signal, the error information having been obtained at a time prior to a time when the optical information that is being corrected was obtained from the detection optical system; and a detecting unit, electrically connected to the correction processor, that detects a position of the object based on the correcting signal.
  2. 11. A position detecting apparatus comprising: a detection optical system arranged to obtain an optical information including a position of an object to be detected; a detector including a detecting area and arranged to convert the optical information into an electrical signal; a memory unit that stores an error information about the position detecting apparatus with respect to at least one of a manufacturing error in the detection optical system, a residual optical error in the detection optical system and an electrical error caused by a manufacturing error in the position detecting apparatus; a correction processor, electrically connected to the detector and the memory unit, that corrects the electrical signal based on the error information in order to compensate for at least one of the manufacturing error of the detection optical system, the residual optical error of the detection optical system and the electrical error caused by the manufacturing error of the position detecting apparatus, and generates a correcting signal; and a detecting unit, electrically connected to the correction processor, that detects a position of the object based on the correcting signal.
  3. 17. The position detecting apparatus of 11, wherein the error information having been obtained at a time prior to a time when the optical information that is being corrected was obtained from the detection optical system.
  4. 18. An exposure apparatus comprising: an illumination system arranged to illuminate a mask having an exposure pattern; a projection system arranged to project an image of the exposure pattern onto a photosensitive substrate having a detecting mark; and a position detecting apparatus arranged to detect the detecting mark; wherein the position detecting apparatus comprises: a detection optical system arranged to obtain an optical information including a position of the detecting mark; a detector including a detecting area and arranged to convert the optical information into an electrical signal; a memory unit that stores an error information arising according to a detecting position of the detecting area; a correction processor, electrically connected to the detector and the memory unit, that corrects the electrical signal based on the error information, and generates a correcting signal, the error information having been obtained at a time prior to a time when the optical information that is being corrected was obtained from the detection optical system; and a detecting unit, electrically connected to the correction processor, that detects a position of the detecting mark based on the correcting signal.
  5. 32. An exposure apparatus comprising: an illumination system arranged to illuminate a mask having an exposure pattern; a projection system arranged to project an image of the exposure pattern onto a photosensitive substrate having a detecting mark; and a position detecting apparatus arranged to detect the detecting mark; wherein the position detecting apparatus comprises: a detection optical system arranged to obtain an optical information including a position of the detecting mark; a detector including a detecting area and arranged to convert the optical information into an electrical signal; a memory unit that stores an error information about the position detecting apparatus with respect to at least one of a manufacturing error in the detection optical system, a residual optical error in the detection optical system and an electrical error caused by a manufacturing error in the position detecting apparatus; a correction processor, electrically connected to the detector and the memory unit, that corrects the electrical signal based on the error information in order to compensate for at least one of the manufacturing error of the detection optical system, the residual optical error of the detection optical system and the electrical error caused by the manufacturing error of the position detecting apparatus, and generates a correcting signal; and a detecting unit, electrically connected to the correction processor, that detects a position of the object based on the correcting signal.
  6. 45. A method for detecting a position of an object by using a position detecting apparatus that includes a detection optical system that obtains an optical information with respect to the object and a detector that converts the optical information into an electrical information by using a detecting area, comprising the steps of: obtaining an error information arising according to a detecting position of the detecting area; obtaining the electrical information of the object by using the detector; and correcting the obtained electrical information of the object based on the obtained error information, the error information having been obtained at a time prior to a time when the optical information that is being corrected was obtained from the detection optical system.
  7. 46. A method for detecting a position of an object by using a position detecting apparatus that includes a detection optical system that obtains an optical information with respect to the object and a detector that converts the optical information into an electrical information, comprising the steps of: obtaining an error information about the position detecting apparatus with respect to at least one of a manufacturing error in the detection optical system, a residual optical error in the detection optical system and an electrical error caused by a manufacturing error in the position detecting apparatus; obtaining the electrical information of the object by using the detector; and correcting the obtained electrical information of the object based on the obtained error information in order to compensate for at least one of the manufacturing error of the detection optical system, the residual optical error of the detection optical system and the electrical error caused by the manufacturing error of the position detecting apparatus.
  8. 47. A method for fabricating a semiconductor device or a liquid crystal device, comprising the steps of: aligning at least a photosensitive substrate; illuminating a mask with light having a predetermined wavelength; and projecting an image of a pattern formed on the mask onto the photosensitive substrate; wherein the aligning step includes a detecting step of detecting a position of the photosensitive substrate by using a position detecting apparatus that includes a detection optical system that obtains an optical information with respect to the photosensitive substrate and a detector that converts the optical information into an electrical information by using a detecting area; wherein the detecting step comprises the steps of: obtaining an error information arising according to a detecting position of the detecting area; obtaining the electrical information of the object by using the detector; and correcting the obtained electrical information of the photosensitive substrate based on the obtained error information, the error information having been obtained at a time prior to a time when the optical information that is being corrected was obtained from the detection optical system.
  9. 48. A method for fabricating a semiconductor device or a liquid crystal device, comprising the steps of: aligning at least a photosensitive substrate; illuminating a mask with light having a predetermined wavelength; and projecting an image of a pattern formed on the mask onto the photosensitive substrate; wherein the aligning step includes a detecting step of detecting a position of the photosensitive substrate by using a position detecting apparatus that includes a detection optical system that obtains an optical information with respect to the photosensitive substrate and a detector that converts the optical information into an electrical information; wherein the detecting step comprises the steps of: obtaining an error information about the position detecting apparatus with respect to at least one of a manufacturing error in the detection optical system, a residual optical error in the detection optical system and an electrical error caused by a manufacturing error in the position detecting apparatus; obtaining the electrical information of the object by using the detector; and correcting the obtained electrical information of the photosensitive substrate based on the obtained error information in order to compensate for at least one of the manufacturing error of the detection optical system, the residual optical error of the detection optical system and the electrical error caused by the manufacturing error of the position detecting apparatus.

References Cited

U.S. Patent Documents

Document NumberAssigneesInventorsIssue/Pub Date
US5008702* Ltd. Hitachi Tanaka et al. Apr 1991
US5182615* Canon Kabushiki Kaisha Kurosawa et al. Jan 1993
US5640243* Nikon Corporation Koitabashi et al. Jun 1997
US5654553* Nikon Corporation Kawakubo et al. Aug 1997
US5773180* Mitsubishi Denki Kabushiki Kaisha Tomimatu Jun 1998
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US6549271* Nikon Corporation Yasuda et al. Apr 2003

Foreign Patent Documents

Document NumberAssigneesInventorsIssue/Pub Date
JP07071918NIKON CORPMar 1995
* cited by examiner

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