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US6875079: Methods of working, especially polishing, inhomogeneous materials

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Filing Information

Inventor(s) Joerg Kegeler ·
Assignee(s) Schott Glas ·
Attorney/Agent(s) Michael J. Striker ·
Primary Examiner George Nguyen ·
Application Number US10283955
Filing date 10/30/2002
Issue date 04/05/2005
Prior Publication Data
Predicted expiration date 10/30/2022
U.S. Classifications 451/7  · 451/461  · 451/547  · 451/53  ·
International Classifications --
Kind CodeB2
International Classifications 451 7 · 451 53 · 451547 · 451461 · 501 7 · 21912169 ·
Foreign Priority DE10154050 - 11/02/2001 ·
10 Claims, 2 Drawings


Abstract

An inhomogeneous glass ceramic material having a ceramic phase and a glass phase is polished by a method that reduces surface roughness at a preselected temperature to values less than 2 Å. The method includes polishing the surface of the glass ceramic material at a predetermined working temperature with a polishing wheel and/or a suspension and selecting the predetermined working temperature so that differing erosion of the glass phase and the ceramic phase is compensated because of the different thermal expansion coefficients when the glass ceramic material is at the preselected temperature. In the case of the glass ceramic material the working temperature generally should be below the preselected temperature in order to minimize surface roughness.

Independent Claims | See all claims (10)

  1. 1. A method of polishing a surface of an inhomogeneous material so as to reduce surface roughness of said surface at a preselected temperature, said inhomogeneous material comprising two different components present on said surface to be polished, said two different components having different erosion rates and different thermal expansion coefficients, wherein said method comprises the steps of: a) selecting a working temperature at which said surface of said inhomogeneous material is polished so that differing erosion of said two different components is compensated so that surface roughness is thereby reduced because of differing thermal expansion of said different components due to said different thermal expansion coefficients when said inhomogeneous material is at said preselected temperature; and b) polishing said surface of said inhomogeneous material at said working temperature; whereby said surface roughness of said surface is minimized when said inhomogeneous material at said preselected temperature.
  2. 2. A method of polishing a surface of an inhomogeneous material so as to reduce surface roughness of said surface at a preselected temperature, said inhomogeneous material comprising two different components present on said surface to be polished, said two different components having different erosion rates and different thermal expansion coefficients, wherein said method comprises the steps of: a selecting a working temperature at which said surface of said inhomogeneous material is polished so that differing erosion of said two different components is compensated because of said different thermal expansion coefficients when said inhomogeneous material is at said preselected temperature; and b) polishing said surface of said inhomogeneous material at said working temperature; wherein said inhomogeneous material is a glass ceramic material comprising a ceramic phase with negative thermal expansion coefficient and a glass phase with a positive thermal expansion coefficient, said glass phase has a greater erosion rate than that of said ceramic phase and said preselected temperature is greater than said working temperature; whereby said surface roughness of said surface is minimized when said inhomogeneous material at said preselected temperature.
  3. 6. A method of polishing a surface of an inhomogeneous material so as to reduce surface roughness of said surface at a preselected temperature, said inhomogeneous material comprising two different components present on said surface to be polished, said two different components having different erosion rates and different thermal expansion coefficients, wherein said method comprises the steps of: a) polishing said surface of said inhomogeneous material at a predetermined working temperature with at least one of a polishing wheel and a suspension; and b) selecting said predetermined working temperature so that differing erosion of said two different components is compensated so that said surface roughness is thereby reduced because of differing thermal expansion of said different components due to said different thermal expansion coefficients of said two different components when said inhomogeneous material is at said preselected temperature; whereby said surface roughness of said surface is minimized when said inhomogeneous material is at said preselected temperature.
  4. 7. A method of polishing a surface of an inhomogeneous material so as to reduce surface roughness of said surface at a preselected temperature, said inhomogeneous material comprising two different components present on said surface to be polished, said two different components having different erosion rates and different thermal expansion coefficients wherein said method comprises the steps of: a) a polishing said surface of said inhomogeneous material at a predetermined working temperature with at least one of a polishing wheel and a suspension; and b) selecting said predetermined working temperature so that differing erosion of said two different components is compensated because of said different thermal expansion coefficients of said two different components when said inhomogeneous material is at said preselected temperature; wherein said inhomogeneous material is a glass ceramic material comprising a ceramic phase with a negative thermal expansion coefficient and a glass phase with a positive thermal expansion coefficient, said glass phase has a greater erosion rate than that of said ceramic phase and said preselected temperature is greater than said working temperature; whereby said surface roughness of said surface is minimized when said inhomogeneous material is at said preselected temperature.

References Cited

U.S. Patent Documents

Document NumberAssigneesInventorsIssue/Pub Date
US5364655 Hitachi Ltd. Nakamura et al. Nov 1994
US5508235* Schott Glass Technologies, Inc. Marker Apr 1996
US5742026* Corning Incorporated Dickinson et al. Apr 1998
US5842909* Micron Technology, Inc. Sandhu et al. Dec 1998
US5868953 Kabushiki Kaisya Ohara Maekawa Feb 1999
US5873769* Industrial Technology Research Institute Chiou et al. Feb 1999
US6077151* VLSI Technology, Inc. Black et al. Jun 2000
US6257955* Infineon Technologies AG Springer et al. Jul 2001
US6315635* Taiwan Semiconductor Manufacturing Company, Ltd Lin Nov 2001
US6458018* 3M Innovative Properties Company Goers et al. Oct 2002

Foreign Patent Documents

Document NumberAssigneesInventorsIssue/Pub Date
DE69601697YAMAMURA GLASS CO LTDJul 1999
DE69521911SEAGATE TECHNOLOGY LLCNov 2001
EP0934801SHIN-ETSU HANDOTAI COMPANY LIMITEDAug 1999
* cited by examiner

Referenced By

Document NumberAssigneeInventorsIssue/Pub Date
US8602845 --

Patent Family