Filing Information

Inventor(s)	Walter Stonas · Louis J. Dietz · Ian D. Walton · Michael J. Natan · James L. Winkler ·
Assignee(s)	Nanoplex Technologies, Inc. ·  View assignee updates
Attorney/Agent(s)	Swanson & Bratschun LLC · William Leschensky ·
Primary Examiner	Arun S. Phasge ·
Application Number	US9969518
Filing date	10/02/2001
Issue date	07/19/2005
Prior Publication Data	US20020104762 - 08/08/2002
Predicted expiration date	12/21/2020
Patent term adjustment	184
U.S. Classifications	205/74  · 205/131  · 205/122  · 205/76  ·
International Classifications	--
Kind Code	B2
International Classifications	205 74 · 205 76 · 205122 · 205131 · 216 56 ·
Related U.S. Application Data	RELATED APPLICATIONS This application is a Continuation-in-Part of U.S. Utility application Ser. No. 09/677,203, filed Oct. 2, 2000 entitled “Method of Manufacture of Colloidal Rod Particles as Nanobar Codes,” which is a Continuation-in-Part of U.S. Utility application Ser. No. 09/598,395, filed Jun. 20, 2000, entitled “Colloidal Rod Particles as Nanobar Codes.” The 09/598,395 Application was filed claiming the benefit of the filing date of U.S. Provisional Application Ser. No. 60/157,326, filed Oct. 1, 1999, entitled “Self Barcoded Colloidal Metal Nanoparticles;” U.S. Provisional Application Ser. No. 60/189,151, filed Mar. 14, 2000, entitled “Nanoscale Barcodes;” U.S. Provisional Application Ser. No. 60/190,247, filed Mar. 17, 2000, entitled “Colloidal Rod Particles as Barcodes;” and U.S. Provisional Application Ser. No. 60/194,616, filed Apr. 5, 2000, entitled “Nanobarcodes: Technology Platform for Phenotyping.” The U.S. Utility application Ser. No. 09/677,203 application was filed claiming the benefit of the filing date of U.S. Provisional application Ser. No. 60/212,167, filed Jun. 16, 2000, entitled “Techniques for Multiple Parallel Nanobarcode Synthesis.” This application also claims the benefit of the filing date of U.S. Provisional Application Ser. No. 60/237,322, filed Oct. 2, 2000, entitled “Methods for the Manufacture of Colloidal Rod Particles as Nanobar Codes,” and U.S. Provisional Application Ser. No. 60/285,017, filed Apr. 19, 2001, entitled “Method of Manufacture of Colloidal Rod Particles.”

Abstract

Independent Claims | See all claims (9)

1. 1. A method for the manufacture of a free standing segmented nanoparticle comprising a plurality of materials, the method comprising: a. providing a template comprising a plurality of pores by the method comprising the steps: i) providing a resist-coated substrate; ii) exposing a pattern on said resist-coated substrate using a photolithographic technique; iii) developing said pattern; iv) etching said pattern to form a plurality of pores; b. causing deposition of a first material into said pores; c. causing deposition of a second material into said pores; and d. releasing said segmented nanoparticles from said template, wherein a segment bisects the length of the particle.
2. 7. A method for the manufacture of a free standing segmented nanoparticle comprising a plurality of materials, the method comprising: a. providing a mask comprising a plurality of cylindrical posts, by the method comprising: i) providing a resist-coated substrate; ii) exposing a pattern on said resist-coated substrate using a photolithographic technique; iii) developing said pattern; and iv) etching said pattern; b. placing said mask over a substrate; c. etching a plurality of pores into said substrate; d. causing deposition of a first material into said pores of the substrate; e. causing deposition of a second material into said pores of the substrate; f. releasing said segmented nanoparticles from said substrate, wherein a segment bisects the length of the particle.
3. 8. A method for the manufacture of a free standing segmented nanoparticle comprising a plurality of materials, the method comprising: a. providing a planer substrate; b. causing deposition of a layer of a first material on the surface of said substrate; c. causing deposition of a layer of a second material on the surface of said first material; d. depositing a layer of photoresist on the surface of the substrate; e. exposing a pattern on said resist coated substrate using a photolithographic technique; f. developing said pattern; g. etching said pattern through said first and second materials to create a segmented nanoparticles on the surface of said substrate; and h. releasing said segmented nanoparticle from said substrate, wherein a segment bisects the length of the particle.
4. 9. A method for the manufacture of a free standing segmented nanoparticle comprising a plurality of materials, the method comprising: a. providing a template comprising a plurality of pores by the method comprising the steps: i) providing a multi-layer stack comprising photoresist; ii) exposing a pattern on said photoresist; iii) developing said pattern; iv) etching said pattern to form a plurality of pores; b. causing deposition of a first material into said pores; c. causing deposition of a second material into said pores; and d. releasing said segmented nanoparticles from said template, wherein a segment bisects the length of the particle.